Structural and electrical properties of Fe-doped TiO2 thin films
Détails
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Etat: Public
Version: Final published version
ID Serval
serval:BIB_B68C69FDFD02
Type
Article: article d'un périodique ou d'un magazine.
Collection
Publications
Institution
Titre
Structural and electrical properties of Fe-doped TiO2 thin films
Périodique
Journal of Physics D - Applied Physics
ISSN-L
0022-3727
Statut éditorial
Publié
Date de publication
1998
Peer-reviewed
Oui
Volume
31
Pages
1149-1154
Langue
anglais
Résumé
The present study discusses the effect of iron doping in TiO2 thin films
deposited by rf sputtering. Iron doping induces a structural
transformation from anatase to rutile and electrical measurements
indicate that iron acts as an acceptor impurity. Thermoelectric power
measurement shows a transition between n-type and p-type electrical
conduction for an iron concentration around 0.13 at.%. The highest
p-type conductivity at room temperature achieved by iron doping was
10(-6) S m(-1).
deposited by rf sputtering. Iron doping induces a structural
transformation from anatase to rutile and electrical measurements
indicate that iron acts as an acceptor impurity. Thermoelectric power
measurement shows a transition between n-type and p-type electrical
conduction for an iron concentration around 0.13 at.%. The highest
p-type conductivity at room temperature achieved by iron doping was
10(-6) S m(-1).
Création de la notice
01/10/2012 20:07
Dernière modification de la notice
20/08/2019 16:24
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