Structural and electrical properties of Fe-doped TiO2 thin films

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State: Public
Version: Final published version
Serval ID
serval:BIB_B68C69FDFD02
Type
Article: article from journal or magazin.
Collection
Publications
Institution
Title
Structural and electrical properties of Fe-doped TiO2 thin films
Journal
Journal of Physics D - Applied Physics
Author(s)
Bally A.R., Korobeinikova E.N., Schmid P.E., Lévy F., Bussy F.
ISSN-L
0022-3727
Publication state
Published
Issued date
1998
Peer-reviewed
Oui
Volume
31
Pages
1149-1154
Language
english
Abstract
The present study discusses the effect of iron doping in TiO2 thin films
deposited by rf sputtering. Iron doping induces a structural
transformation from anatase to rutile and electrical measurements
indicate that iron acts as an acceptor impurity. Thermoelectric power
measurement shows a transition between n-type and p-type electrical
conduction for an iron concentration around 0.13 at.%. The highest
p-type conductivity at room temperature achieved by iron doping was
10(-6) S m(-1).
Create date
01/10/2012 19:07
Last modification date
20/08/2019 15:24
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